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We found one live option for pgmea: AZ® EBR Solvent.
The option is AZ® EBR Solvent.
Source: iMicromaterials
Description
AZ® EBR Solvent is high purity propylene glycol monomethyl ether acetate (PGMEA) offered by Integrated Micro Materials for microlithography and semiconductor processing applications. It is formulated for photoresist thinning, edge bead removal, and general cleaning of photoresist residues from equipment surfaces or substrate backsides.
Best for
semiconductor manufacturing professionals, lithography engineers, photoresist thinning and edge bead removal
Rate this product
| option | #1AZ® EBR Solvent |
|---|---|
| Source | iMicromaterials |
| Description | AZ® EBR Solvent is high purity propylene glycol monomethyl ether acetate (PGMEA) offered by Integrated Micro Materials for microlithography and semiconductor processing applications. It is formulated for photoresist thinning, edge bead removal, and general cleaning of photoresist residues from equipment surfaces or substrate backsides. |
| Best for | semiconductor manufacturing professionals, lithography engineers, photoresist thinning and edge bead removal |
| Action | iMicromaterials |
| Rate this product |
"AZ® EBR Solvent from iMicromaterials."
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