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We reviewed 3 live results for pgmea and narrowed them down to the 3 options that look most worth comparing first.
The options are AZ® EBR Solvent, Kanto Kagaku Singapore Pte Ltd and iMicromaterials.
Source: iMicromaterials
Description
AZ® EBR Solvent is high purity propylene glycol monomethyl ether acetate (PGMEA) offered by Integrated Micro Materials for microlithography and semiconductor processing applications. It is formulated for photoresist thinning, edge bead removal, and general cleaning of photoresist residues from equipment surfaces or substrate backsides.
Best for
semiconductor manufacturing professionals, lithography engineers, photoresist thinning and edge bead removal
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Source: Unknown source
Description
Kanto Kagaku Singapore Pte Ltd supplies high-purity chemicals and electronic grade solvents engineered for semiconductor manufacturing and flat panel display production. Part of the Kanto worldwide network with operations in Singapore and Malaysia, the company provides specialty solvents including acetone, 2-propanol, methanol, cyclohexanone, PGMEA, and comprehensive laboratory reagents.
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Source: Unknown source
Description
Integrated Micro Materials (iMicromaterials) provides lithography materials, process chemicals, and micro-manufacturing consultation services. The company offers photoresist thinners and edge bead removers, including high-purity AZ EBR Solvent (PGMEA) and AZ EBR 70/30 solvent blends, alongside thick, lift-off, DUV, and e-beam photoresists, anti-reflective coatings, developers, adhesion promoters, photoresist dispensing equipment, and test reticles for semiconductor and microfabrication workflows.
Best for
Semiconductor manufacturers, Microfabrication engineers, Photoresist thinning and patterning and Edge bead removal in photolithography
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| Compare | #1AZ® EBR Solvent | #2Kanto Kagaku Singapore Pte Ltd | #3iMicromaterials |
|---|---|---|---|
| Source | iMicromaterials | Unknown source | Unknown source |
| Description | AZ® EBR Solvent is high purity propylene glycol monomethyl ether acetate (PGMEA) offered by Integrated Micro Materials for microlithography and semiconductor processing applications. It is formulated for photoresist thinning, edge bead removal, and general cleaning of photoresist residues from equipment surfaces or substrate backsides. | Kanto Kagaku Singapore Pte Ltd supplies high-purity chemicals and electronic grade solvents engineered for semiconductor manufacturing and flat panel display production. Part of the Kanto worldwide network with operations in Singapore and Malaysia, the company provides specialty solvents including acetone, 2-propanol, methanol, cyclohexanone, PGMEA, and comprehensive laboratory reagents. | Integrated Micro Materials (iMicromaterials) provides lithography materials, process chemicals, and micro-manufacturing consultation services. The company offers photoresist thinners and edge bead removers, including high-purity AZ EBR Solvent (PGMEA) and AZ EBR 70/30 solvent blends, alongside thick, lift-off, DUV, and e-beam photoresists, anti-reflective coatings, developers, adhesion promoters, photoresist dispensing equipment, and test reticles for semiconductor and microfabrication workflows. |
| Best for | semiconductor manufacturing professionals, lithography engineers, photoresist thinning and edge bead removal | Semiconductor manufacturers, Microfabrication engineers, Photoresist thinning and patterning and Edge bead removal in photolithography | |
| Action | iMicromaterials | Kanto Kagaku Singapore Pte Ltd | iMicromaterials |
| Rate this product |
"AZ® EBR Solvent from iMicromaterials."
Note: TopFind AI compiles product and service information for general comparison purposes only.